TEL™ Unity IIe

TEL™ Unity IIe

TEL™ Unity IIe SCCM, 200mm Temperature Profiles using LAUDA-Noah DAQ

Process: Oxide Etch
RF Power: 3.6kW (combined upper & lower electrode)
T Set-point: 20 °C at lower electrode
(*) Chiller: OEM qualified compressor-based chiller vs. LAUDA-Noah POU system

The data acquisition equipment set-up is typical. We have documented the lower electrode cooling loop supply and return fluid temperatures at the request of the customer.

We have also captured the TEL ESC (wafer) temperatures and have used this to correlate the LAUDA-Noah DAQ data. The process recipe information follows:

Contact Etch Process Recipe
Step NameStep #Step TimeRF LowerRF Upper
Stab114/6000
Breakthrough2208001500
Stab38/6000
Main Etch413018001800
Stab56/6000
Over-etch6101001000
Stab74/6000
Dechuck8171001000
Pump9200
211 Seconds or ~3 minutes
Application & Obstacles
  • the customer experiences significant 1st wafer effect and through-the-lot temperature rise due to RF-induced temperature drifts (8 °C+) in their TEL Unity IIe SCCM chambers with the OEM qualified chiller(s)
  • temperature alarms occur with the OEM qualified chiller at their desired 20 °C set-point, so the customer is currently forced to run the process at 25 °C
  • the customer has considered switching back to 20 °C and adding recipe cool-down time for the OEM qualified chiller, however this would negatively impact chamber/tool throughput
  • the OEM qualified chiller's front panel (operator interface) continues to display 20 °C throughout processing!
Evaluating the POU Solution
  • Ramp rate comparison (cooling efficiency)
  • Through-the-lot temperature profile comparisons (25 wafer lots)
    • ESC RTD readings downloaded from the tool's software (screenshots)
    • LAUDA-Noah DAQ - supply & return fluid temperatures monitored with TCs

Ramp Up - 489% Faster
LAUDA-Noah POU ramp/stable UP: 1.7 mins
OEM Chiller ramp/stable UP: 9.0 mins

Ramp Down - 175% Faster
LAUDA-Noah POU ramp/stable DOWN: 3.3 mins
OEM Chiller ramp/stable DOWN: 5.7 mins

OEM Qualified Chiller
OEM Qualified Chiller
LAUDA-Noah POU Chiller
LAUDA-Noah POU Chiller
ESC RTD Readings

OEM Qualified Chiller

  • chiller has 2.5kW cooling capacity
  • 2 season/dummy wafers were run prior to LOT
  • (1st wafer effect ~4 °C temp. rise during seasons not shown)
  • 2.1 °C rise of initial wafer temperature post-seasoning
  • 1/5 °C rise of final wafer temperatures post seasoning
  • ESC temperature average through-the-lot is > 27 °C +
  • Process temperature set-point is 25 °C
  • OEM qualified chiller reads 20 °C through LOT processing

LAUDA-Noah POU Chiller

  • POU has only 1.2kW of cooling capacity @ 20 °C
  • NO seasoning dummy wafers were run prior to this Noah lot
  • < 2.0 °C rise of initial wafer temperatures
  • ~ 2.0 °C rise of final wafer temperatures
  • Noah system closer to original target set-point of 20 °C
Though-the-lot Temperature Profile Comparisons

The fluid temperature profiles below were captured during a production run. This data shows ~2 °C fluid temperature rise per wafer and includes a overall temperature rise through-the-lot. The customer was NOT surprised to see these temperature excursions, as this problem is something the customer has been enduring since the tool was installed. It is important to reiterate; "The OEM qualified chiller was reporting a ~20 °C through the entire process!! (shown as supply fluid temperature)"

The fluid temperature profiles above were captured during a production run under "identical conditions" as the previous data-set. Note the improved temperature uniformity. It is important to point out that this data-set was acquired using DEFAULT P.I.D. settings on the LAUDA-Noah controller. Even with FACTORY SETTINGS, the LAUDA-Noah POU system has reduced the overall temperature variance per wafer by more than 50%.

OEM Qualified Chiller
OEM Qualified Chiller
LAUDA-Noah POU Chiller
LAUDA-Noah POU chiller